Quick Dump Rinse | Wet Process Rinse Tanks

Rinse Tanks

After chemical treatment of semiconductor wafers for cleaning, etching or stripping applications, it is important to properly rinse all the parts to remove any chemical residues. In fact, once removed from the chemical bath, the wafer surface is still covered in chemistry, which results in a continuous chemical process outside the bath. This can lead in over etching or stripping, thus causing production loss and failures.

To overcome these problems, it is necessary to properly rinse the wafers with D.I water using a quick dump rinse or a quench.

SAT offers different rinse tanks to safely and effectively rinse and remove any traces of chemicals left in the wafers. We offer both standard and custom sizes, in order to satisfy the different requirements of our customers.

SAT rinse tanks come in different construction materials, including: Polypropylene (PPS), PVDF, Teflon PTFE/PFA, PVC, and Stainless Steel. Also available in "FM" (Factory Mutual) materials of construction.

Quick dump rinse

Provides and excellent and immediate cleaning action thanks to the to the action of the kinetic energy produced from

the emptying speed and to the solvent power of d.i. water, thus removing any small particle and/or chemical residue due to the etching treatment.

Quench

Powered by D.I. water in overflow allows you to keep batch of semiconductor wafers perfectly clean and free of any bacterial charges during standby process.

Features and Benefits

Hot D.I. water compatible
Four sided overflow option
Standalone or built into wet bench

QDR/Quench

SAT offers a special patented rinse tank that is a hybrid between a quick dump rinse and a quench. The QDR/Quench is the result of a R&D project that has the objective of safely and effectively rinse and remove any traces of chemicals in the wafers. It comes in standard and custom sizes and in different construction materials.

It's manufactured in clean room environment, class 100, with custom CNC processes that do not release impurities or particles during the transformation of the raw material into the finished product.

The advantages of using the SAT hybrid QDR/Quench rinse tanks are the triple functions of quick dump rinse, quench and cleaning spray, virtually the state-of-the-art concentrated in one module.

Features and Benefits

Hot DI Water compatible
Designed according to SEMI S2-0302 standards
Construction materials include: Polypropylene (PPS), PVDF, Teflon PTFE/PFA, PVC, and Stainless Steel.
Available in "FM" (Factory Mutual) materials
Quality certification according to ISO 9001
CE certification
1 year warranty
Standard and custom sizes available

QDR:

The QDR tank (pos. 3), is linked to the patented pneumatic valve chamber (pos. 2) and to the recovery tank support (pos. 1),

to provide an excellent and immediate cleaning action thanks to the action of the kinetic energy produced from the emptying speed and to the solvent power of d.i. water, thus removing any small particle and/or chemical residue due to the etching treatment.

Quench:

Powered by d.i.water in overflow allows you to keep batch of semiconductor wafers perfectly clean and free of any bacterial charges during standby process (pos. 3)

Spray system:

Allows prewashing of semiconductor wafers already in filling phase of the QDR tank (pos. 3) thanks to the spray nozzle kit system (pos.1)

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