Semi Automated Wet Benches
SAT8X2 is a wet bench with the function of front oxide etching and it has a structure made in PVC-C FM4910 approved.
It has the following external dimensions: 1800mm width x 1000mm depth x 2000mm height, with a total weight of about 750 Kg.
The wet bench is configured for wet attack of the oxides of the devices produced in the wafer fab CT6 with size from 6”/8”.
The work plan includes:
# 2 Process Tank double carrier 8”, made in PVDF (external dimensions: 585mm x 280mm x 330mm height) complete with:
Cooling and heating system through chillers and heather in outer barrel;
Recirculation system of the etching solution through pumps;
Solution microfiltration system.
# 2 Rinse Quench in D.I. H2O double carrier 8”, made in Polypropylene (internal dimensions: 585mm x 280mm x 345mm height) complete with:
Clean-up system for washing interventions
H2O flow adjustable with carrier presence sensor, which also allows the overflow of H2O;
Rinse time can be changed via PLC.
The wet bench SAT8X2 is equipped with a combined Chiller + Heater system, which allows the constant maintenance of the process temperature of the chemical present inside the tank, which must be equal to 28°C (to be determined).